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Precipitation, ripening and chemical effects during annealing of Ge+ implanted SiO2 layers

✍ Scribed by K.H Heinig; B Schmidt; A Markwitz; R Grötzschel; M Strobel; S Oswald


Book ID
114170804
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
366 KB
Volume
148
Category
Article
ISSN
0168-583X

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