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Formation of photoluminescence centers during annealing of SiO2layers implanted with Ge ions

โœ Scribed by G. A. Kachurin; L. Rebohle; I. E. Tyschenko; V. A. Volodin; M. Voelskow; W. Skorupa; H. Froeb


Book ID
110120295
Publisher
Springer
Year
2000
Tongue
English
Weight
90 KB
Volume
34
Category
Article
ISSN
1063-7826

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