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Potential sputtering from a Si surface by very highly charged ion impact

✍ Scribed by Masahide Tona; Hirofumi Watanabe; Satoshi Takahashi; Nobuyuki Nakamura; Nobuo Yoshiyasu; Makoto Sakurai; Chikashi Yamada; Shunsuke Ohtani

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
205 KB
Volume
258
Category
Article
ISSN
0168-583X

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Potential sputtering and kinetic sputter
Potential sputtering and kinetic sputtering from a water adsorbed Si(1 0 0) surface with slow highly charged ions
✍ N. Okabayashi; K. Komaki; Y. Yamazaki πŸ“‚ Article πŸ“… 2005 πŸ› Elsevier Science 🌐 English βš– 241 KB

We measured charge state dependence and incident angle dependence of sputtering yields and two-dimensional (2D) position distributions for H + , Si + and SiOH + ions emitted from a water adsorbed Si(1 0 0) surface irradiated by a few keV Ar q+ (q = 4-8). It was found that (1) H + yield strongly depe