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Sputtering by highly charged ions: Application of the XY–TOF technique to secondary ion ejection from LiF

✍ Scribed by J. Lenoir; P. Boduch; H. Rothard; B. Ban-d’Etat; T. Been; A. Cassimi; T. Jalowy; H. Lebius; B. Manil; J.M. Ramillon


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
641 KB
Volume
258
Category
Article
ISSN
0168-583X

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