Plasma Processing for VLSI
β Scribed by Norman G. Einspruch
- Publisher
- Academic Pr
- Year
- 1984
- Tongue
- English
- Leaves
- 536
- Series
- Vlsi Electronics Microstructure Science 8
- Edition
- 1st
- Category
- Library
No coin nor oath required. For personal study only.
β¦ Subjects
Π€ΠΈΠ·ΠΈΠΊΠ°;Π€ΠΈΠ·ΠΈΠΊΠ° ΠΏΠ»Π°Π·ΠΌΡ;
π SIMILAR VOLUMES
This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.<br><br>This book focu
This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.<br><br>This book focu
The companion volumes to this book are Volume 1- Process Technology and Volume 3- The Submicron MOSFET
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be a