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Plasma polymerized methyl-methacrylate as an electron-beam resist

โœ Scribed by S. Morita; J. Tamano; S. Hattori; M. Ieda

Book ID
126268764
Publisher
American Institute of Physics
Year
1980
Tongue
English
Weight
482 KB
Volume
51
Category
Article
ISSN
0021-8979

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Electron beam lithography using plasma p
Electron beam lithography using plasma polymerized hexane as resist
โœ R.H. Pedersen; M. Hamzah; S. Thoms; P. Roach; M.R. Alexander; N. Gadegaard ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 339 KB

We present electron beam lithography using thin layers of plasma polymerized hexane as resist, as an alternative for conventional spincoated resists. Hexane is chosen due to the possible bioapplications, as well as the relatively simple polymerization chemistry. Successful patterning of micro-and na