𝔖 Bobbio Scriptorium
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Plasma oxidation of Si and SiGe

✍ Scribed by I.G. Goh; J.F. Zhang; S. Hall; W. Eccleston; K. Werner


Book ID
103599402
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
317 KB
Volume
28
Category
Article
ISSN
0167-9317

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Application of plasma oxidation to strai
✍ Mika Nishisaka; Tanemasa Asano πŸ“‚ Article πŸ“… 2005 πŸ› Elsevier Science 🌐 English βš– 641 KB

We have applied microwave-plasma oxidation to the gate oxide formation of strained-Si metal-oxide-semiconductor field-effect-transistor (MOSFET). Change in surface morphology of plasma oxidized strained-Si/SiGe is studied using an atomic force microscope (AFM) and compared with thermal oxidation. Th