Silicon nitride films produced by plasma enhanced chemical vapor deposition (PECVD) have been studied as antireflection (AR) coating on polycrystalline silicon solar cells. A substantial enhancement (28%) in the short circuit current (Isc) has been obtained. The open circuit voltage (Voc) of these c
โฆ LIBER โฆ
Plasma nitride AR coatings for silicon solar cells
โ Scribed by Fred W. Sexton
- Book ID
- 107905661
- Publisher
- Elsevier Science
- Year
- 1982
- Weight
- 599 KB
- Volume
- 7
- Category
- Article
- ISSN
- 0165-1633
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