𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Plasma ion sources CVD plasma aspects, limits and possibilities

✍ Scribed by Daniel C Schram

Book ID
114170141
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
292 KB
Volume
139
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Control of high-density plasma sources f
Control of high-density plasma sources for CVD and etching
✍ K Suzuki; H Sugai; K Nakamura; TH Ahn; M Nagatsu πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 734 KB

Large-diameter high-density plasmas such as ECR, he/icon-, inductively-coupled, and surface-wave plasmas have been developed for thin film technologies in the next generation. Applications of such high density plasmas to etching and CVDprocesses require deeper understanding of discharge physics as w