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Plasma-enhanced chemical vapour deposition of silicon nitride from SiCl4, nitrogen and hydrogen on hard metals

✍ Scribed by I. Endler; A. Leonhardt; M. Schönherr; E. Wolf


Publisher
Springer
Year
1991
Tongue
English
Weight
432 KB
Volume
26
Category
Article
ISSN
0022-2461

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