✦ LIBER ✦

Plasma chemistry during deposition of a-C:H

✍ Scribed by Benedikt, J.; Letourneur, K.G.Y.; Wisse, M.; Schram, D.C.; van de Sanden, M.C.M.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Plasma chemistry during the deposition o

✍ Benedikt, J.; Woen, R.V.; van Mensfoort, S.L.M.; Perina, V.; Hong, J.; van de Sa 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 425 KB

Plasma chemistry of an expanding Ar/C2H2

✍ van de Sanden, M.C.M; van Hest, M.F.A.M; de Graaf, A; Smets, A.H.M; Letourneur, 📂 Article 📅 1999 🏛 Elsevier Science 🌐 English ⚖ 221 KB

Deposition of α-C:H films in a Hall acce

✍ Fedoseev, D.V.; Rychkov, B.A.; Chuzhko, R.K.; Lubnin, E.N.; Klepikov, A.V.; Tito 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 380 KB

Plasma processes in methane discharges d

✍ E.H.A. Dekempeneer; J. Smeets; J. Meneve; L. Eersels; R. Jacobs 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 366 KB

Target effects during the deposition of

✍ J.T. Harnack; F. Thieme; C. Benndorf 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 412 KB

Deposition of ta-C:H films by r.f. plasm

✍ Schwan, J.; Ulrich, S.; Jung, K.; Ehrhardt, H.; Samlenski, R.; Brenn, R. 📂 Article 📅 1995 🏛 Elsevier Science 🌐 English ⚖ 494 KB