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Deposition of ta-C:H films by r.f. plasma discharges

โœ Scribed by Schwan, J.; Ulrich, S.; Jung, K.; Ehrhardt, H.; Samlenski, R.; Brenn, R.


Book ID
121381175
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
494 KB
Volume
4
Category
Article
ISSN
0925-9635

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