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Deposition of α-C:H films in a Hall accelerator plasma

✍ Scribed by Fedoseev, D.V.; Rychkov, B.A.; Chuzhko, R.K.; Lubnin, E.N.; Klepikov, A.V.; Titova, T.K.; Fedorov, V.V.

No coin nor oath required. For personal study only.

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