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Deposition of a-C:H films from argon/cyclohexane plasma on polymer substrates

✍ Scribed by Fedoseev, D.V.; Tolmachev, Yu.N.; Varshavskaya, I.G.; Bukhovets, V.L.


Book ID
121942531
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
371 KB
Volume
5
Category
Article
ISSN
0925-9635

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Amorphous carbon nitride thin films were deposited on polymer substrates using radio frequency (rf) plasma in a mixture of nitrogen (N 2 ) and acetylene (C 2 H 2 ) gasses. The samples were prepared at different rf plasma power (350, 400, 450, 500, and 550 W), at constant plasma exposure time of 10 m