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Plasma and Thermal ALD of Al[sub 2]O[sub 3] in a Commercial 200 mm ALD Reactor

✍ Scribed by van Hemmen, J. L.; Heil, S. B. S.; Klootwijk, J. H.; Roozeboom, F.; Hodson, C. J.; van de Sanden, M. C. M.; Kessels, W. M. M.

Book ID: 117998957
Publisher: The Electrochemical Society
Year: 2007
Tongue: English
Weight: 504 KB
Volume: 154
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.2737629

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