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Plasma and particle flux characterization of the a-C:H deposition process by ion-assisted methods

✍ Scribed by G. Schaarschmidt; F. Scholze; S. Porsch; F. Wolf; T. Wallendorf; W. Scharff; J. Gerber; R. Kleber; W. Dworschak; A. Krüger; K. Jung; H. Ehrhardt

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 519 KB
Volume: 140
Category: Article
ISSN: 0921-5093
DOI: 10.1016/0921-5093(91)90515-o

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