Physical/chemical properties of tin oxide thin film transistors prepared using plasma-enhanced atomic layer deposition

✍ Scribed by Byung Kook Lee; Eunae Jung; Seok Hwan Kim; Dae Chul Moon; Sun Sook Lee; Bo Keun Park; Jin Ha Hwang; Taek-Mo Chung; Chang Gyoun Kim; Ki-Seok An

• Book ID: 119322486
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 816 KB
• Volume: 47
• Category: Article
• ISSN: 0025-5408
• DOI: 10.1016/j.materresbull.2012.04.120