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Physical Properties of Titanium Oxide Thin Films Prepared by DC Magnetron Sputtering: Influence Substrate Temperature and O2/Ar in the Gas Mixture

✍ Scribed by Hantehzadeh, M. R.; Amouha, M. Amou; Solaymani, S.; Osati, T.; Ghobadi, B.

No coin nor oath required. For personal study only.

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