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Characterization of Tantalum Oxide Thin Films Prepared by Cylindrical Magnetron Sputtering: Influence of O2% in the Gas Mixture

✍ Scribed by Hantehzadeh, M. R.; Hassani Sadi, E.; Darabi, E.

Book ID: 113070944
Publisher: Springer
Year: 2011
Tongue: English
Weight: 468 KB
Volume: 31
Category: Article
ISSN: 0164-0313
DOI: 10.1007/s10894-011-9478-0

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