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Physical and electrical characteristics of the high-k Nd2O3 polyoxide deposited on polycrystalline silicon

✍ Scribed by Chyuan-Haur Kao; T.C. Chan; Kung Shao Chen; Yu-Teng Chung; Wen-Shih Luo

Book ID: 108210866
Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 938 KB
Volume: 50
Category: Article
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2010.02.005

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