Microcrystalline silicon thin films: A r
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A. Dussan; R.H. Buitrago; R.R. Koropecki
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Article
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2008
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Elsevier Science
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English
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In this work we present a study of the optical, electrical, electronic and structural properties of Boron doped hydrogenated microcrystalline silicon thin films (mc-Si:H). The films were deposited in an RF plasma reactor using as reactive gas a mixture of silane and diborane, both highly diluted in