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A percolation model for microcrystalline silicon films

✍ Scribed by J.J. Schellenberg; R.D. McLeod

Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
459 KB
Volume
66
Category
Article
ISSN
0038-1098

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In this work we present a study of the optical, electrical, electronic and structural properties of Boron doped hydrogenated microcrystalline silicon thin films (mc-Si:H). The films were deposited in an RF plasma reactor using as reactive gas a mixture of silane and diborane, both highly diluted in