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Photoluminescence from SiN x O y films deposited by reactive sputtering

✍ Scribed by Sombrio, G; Franzen, P L; Maltez, R L; Matos, L G; Pereira, M B; Boudinov, H


Book ID
121448693
Publisher
Institute of Physics
Year
2013
Tongue
English
Weight
567 KB
Volume
46
Category
Article
ISSN
0022-3727

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Characterization of NiO thin films depos
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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper