Characterizing Plasma-exposed In0.52Al0.
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Dr. G. C. Jiang; Dr. C. W. Kuo; Dr. Y. Chang; Dr. Y. D. Juang
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Article
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1996
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John Wiley and Sons
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English
β 444 KB
We have performed Photoreflectance (PR), Raman Scattering (RS), and Photoluminescence (PL) experiments to characterize the Ino.52Alo.48As surface exposed to plasma by a gas mixture of CHJHz/Ar, PR spectra indicate that RIE (plasma) causes defects such as nonradiative recombination centers, scatterin