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Photoelectrochemical Properties of N-Incorporated ZnO Films Deposited by Reactive RF Magnetron Sputtering

✍ Scribed by Ahn, Kwang-Soon; Yan, Yanfa; Lee, Se-Hee; Deutsch, Todd; Turner, John; Tracy, C. Edwin; Perkins, Craig L.; Al-Jassim, Mowafak

No coin nor oath required. For personal study only.

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