Photoconductivity of Si/Ge/Si structures with 1.5 and 2 ML of Ge layer
β Scribed by O.A. Shegai; V.I. Mashanov; A.I. Nikiforov; V.V. Ulyanov; O.P. Pchelyakov
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 214 KB
- Volume
- 42
- Category
- Article
- ISSN
- 1386-9477
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Single-crystal Ge 1 Γ x Sn x alloys (x ΒΌ 0.025, 0.052, and 0.078) with diamond cubic structure have been grown on Si(0 0 1) substrates by molecular beam epitaxy (MBE), using high-quality Ge thin films as buffer layers. The Ge 1 Γ x Sn x alloys are nearly fully strained and have high crystalline qual
At room temperature deposited Ge films (thickness < 3 nm) homogeneously wet CaF 2 /Si(1 1 1). The films are crystalline but exhibit granular structure. The grain size decreases with increasing film thickness. The quality of the homogeneous films is improved by annealing up to 200 8C. Ge films break