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Photocatalytic properties of titanium oxide-based films deposited by PECVD

✍ Scribed by L. Sedláková; M. Horáková; P. Hájková; A. Kolouch; J. Karásek; P. Špatenka

Book ID
111502939
Publisher
Allerton Press, Inc.
Year
2007
Tongue
English
Weight
232 KB
Volume
29
Category
Article
ISSN
1063-4576

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## Abstract The effect of bias voltage on characteristics of ZnO thin films deposited by the electron cyclotron resonance plasma‐enhanced chemical vapor deposition (ECR‐PECVD) method was investigated. The structural, optical and electrical properties of ZnO thin films were studied as a function of