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Phase Formation during the Surface-Diffusion Growth of Ti–Co–Si–N and Ti–Co–N Thin Films on Si and SiO2

✍ Scribed by A. G. Vasiliev; R. A. Zakharov; V. V. Rodatis; A. V. Lobintsov; A. A. Orlikovskii; I. A. Horin

Book ID: 110307563
Publisher: Springer
Year: 2001
Tongue: English
Weight: 289 KB
Volume: 30
Category: Article
ISSN: 1063-7397
DOI: 10.1023/a:1011936611230

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