Parametric study of the chemical vapour deposition of carbon-boron-nitrogen compounds

✍ Scribed by A. Derre; L. Filipozzi; F. Bouyer; A. Marchand

• Book ID: 104743917
• Publisher: Springer
• Year: 1994
• Tongue: English
• Weight: 656 KB
• Volume: 29
• Category: Article
• ISSN: 0022-2461
• DOI: 10.1007/bf00368931

✦ Synopsis

The influence of various parameters controlling the chemical vapour deposition of carbon-boron-nitrogen mixtures has been studied using the experimental designs methodology which provides a valuable phenomenological approach for the initial study of complicated chemical systems. The gaseous precursors used were acetylene (C=H=), boron trichloride (BCI3), and ammonia (NH3). An extended experimental field was investigated, which leads to a very wide composition range for the deposits. All the deposits may be described as hexagonal single phase, including the C-BN-"BC3"" ternary domain. In this composition triangle, no thermodynamically stable boron carbides were found.