Oxygen precipitation in neutron-irradiated Czochralski silicon annealed at elevated temperature
✍ Scribed by Cui, Can ;Yang, Deren ;Ma, Xiangyang ;Fan, Ruixin ;Que, Duanlin
- Book ID
- 105363362
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 159 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
The effects of vacancies introduced by neutron‐irradiation on oxygen precipitation at elevated temperatures in Czochralski (CZ) silicon have been investigated. In comparison with noirradiated CZ silicon, the neutron‐irradiated CZ silicon exhibits stronger oxygen precipitation at 1050 °C or 1150 °C due to the existence of supersaturated vacancies in the bulk. Moreover, it is proved that the oxygen out‐diffusion at high temperature is not enhanced by the supersaturated vacancies induced by neutron‐irradiation. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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The iron precipitation in as-received Czochralski (CZ) silicon during low temperature from 300 to 700 1C was investigated. It was found that the iron precipitation rate was increased in turn from 300 to 700 1C. It was also found that the iron could form small precipitates even at low concentration.