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Oxide precipitation behavior in heavily doped silicon wafer after rapid thermal process

✍ Scribed by Shilong Sun; Weizhong Sun; Qiuyan Hao; Lijian Wang; Xiaoyun Teng; Caichi Liu; Yuesheng Xu

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 391 KB
Volume: 9
Category: Article
ISSN: 1369-8001
DOI: 10.1016/j.mssp.2006.01.013

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