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Oxide field dependence of SiSiO2 interface state generation and charge trapping during electron injection

✍ Scribed by M.M. Heyns; D. Krishna Rao; R.F. De Keersmaecker

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
492 KB
Volume
39
Category
Article
ISSN
0169-4332

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