Oxidation of tantalum film on silicon
β Scribed by A.G. Revesz; J. Allison; T. Kirkendall; J. Reynolds
- Publisher
- Elsevier Science
- Year
- 1974
- Tongue
- English
- Weight
- 218 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0040-6090
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π SIMILAR VOLUMES
## Ahstract -After heating the anodic oxide tilm on tantalum, a constant current or voltage was applied to the specimen in a diluted phosphoric acid solution. and the transient behaviour was examined according to the Frcnkel defect model. Interstitial ions taking part in ionic conduction are captu
## Abstract Anodic oxide films were grown on SiC using various electrolytes. The obtained oxide films were compared and some of their electrophysical properties were investigated. Anodic oxidation of SiC was shown to be useful for precise removal of layers as well as for identification of the polar