The gap of Si nanocrystalline films has been computed using a non-orthogonal tight-binding approach. We have studied the influence of different types of disorder: inter-grain distance, intergrain misorientation, and film roughness on the gap value of these Si films. In all the cases, the variation o
Oxidation effects on the photoluminescent properties of Si nanocrystalline thin films
β Scribed by Kyung Ah Jeon; Jong Hoon Kim; Gun Hee Kim; Sang Yeol Lee
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 321 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0925-3467
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