Effects of substrate temperature on microstructural and photoluminescent properties of nanocrystalline silicon carbide films
β Scribed by Wei Yu; Xinzhan Wang; Wanbing Lu; Shufang Wang; Yalan Bian; Guangsheng Fu
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 410 KB
- Volume
- 405
- Category
- Article
- ISSN
- 0921-4526
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β¦ Synopsis
Nanocrystalline silicon carbide (nc-SiC) thin films have been grown on silicon (1 0 0) substrates by helicon wave plasma enhanced chemical vapor deposition technique and the photoluminescence of the films has been tuned from yellow to blue by changing the substrate temperatures (T s ). The resulting nc-SiC films show a microstructure of 3C-SiC nanocrystallites embedded in hydrogenated amorphous SiC matrix. Detailed analysis of the infrared absorption reveals that the degree of crystallization of the films increases with the increase of T s while the content of hydrogen-related bonds in the films is decreased. The photoluminescence spectra of the nc-SiC films are found to be composed of two Gaussian components. As the T s increases, the component with higher energy shows a growing trend and the corresponding peaks move to high energy side, indicating that the main luminescence mechanism in the films changes from the defect-related carrier recombination to the quantum confinement effect.
π SIMILAR VOLUMES
This paper addresses the effects of substrate temperature on electrical and structural properties of dc magnetron sputter-deposited copper (Cu) thin films on p-type silicon. Copper films of 80 and 500 nm were deposited from Cu target in argon ambient gas pressure of 3.6 mTorr at different substrate