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Optimization of demolding temperature for throughput improvement of nanoimprint lithography

✍ Scribed by T. Leveder; S. Landis; L. Davoust; N. Chaix

Book ID: 104051624
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 547 KB
Volume: 84
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2007.01.066

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