Optimization of 3D patterning by Ga implantation and reactive ion etching (RIE) for nanoimprint lithography (NIL) stamp fabrication

✍ Scribed by Waid, Simon; Wanzenboeck, Heinz D.; Muehlberger, Michael; Bertagnolli, Emmerich

• Book ID: 120547526
• Publisher: Elsevier Science
• Year: 2012
• Tongue: English
• Weight: 516 KB
• Volume: 97
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2012.02.028