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Optical, mechanical and etch properties of amorphous carbon nitride films grown by plasma enhanced chemical vapor deposition at room temperature

✍ Scribed by Sang Hoon Kim; Cheol Min Choi; Kil Mok Lee; Yoon-Bong Hahn


Book ID
116899200
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
498 KB
Volume
160
Category
Article
ISSN
0379-6779

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