Optical measurement of carrier concentration profile in n-type semiconducting GaAs substrate

✍ Scribed by Kitamoto, Takuya ;Inoue, Yusuke ;Yamada, Masayoshi ;Kawase, Tomohiro

• Book ID: 105364177
• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 391 KB
• Volume: 204
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.200674160

✦ Synopsis

Abstract

The light absorption below the fundamental energy gap in n‐type GaAs has been investigated precisely. It is experimentally confirmed that there are the three different mechanisms: (a) the enhancement of fundamental absoption due to the shrinkage of energy gap and band filling by doping Si atoms, (b) deep‐level (EL2) absorption, and (c) free‐carrier absorption. It is found that the transmittance measurement at the wavelength longer than about 1000 nm in the free‐carrier absorption region is more useful and direct, compared with that near the fundamental absorption region from 900 nm to 950 nm, precisely to determine the carrier concentration in n‐type GaAs. The two‐dimensional profile of carrier concentration in a VB‐grown 3 ϕ GaAs substrate is measured in high spatial resolution with the short time less than 5 seconds by using a sophisticated near‐infrared transmittance‐measuring equipment. The absolute amount and homogeneity of carrier concentration can be assessed in the range from 0.3 to 3 × 10^18^ cm^–3^. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)