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Optical characterization of laser processed ultra-shallow junctions

✍ Scribed by G. Kerrien; M. Hernandez; C. Laviron; T. Sarnet; D. Débarre; T. Noguchi; D. Zahorski; J. Venturini; M.N. Semeria; J. Boulmer

Book ID
108417945
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
186 KB
Volume
208-209
Category
Article
ISSN
0169-4332

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✍ Peter Borden 📂 Article 📅 2001 🏛 Elsevier Science 🌐 English ⚖ 266 KB

As ULSI technology moves below the 180 nm technology node, tight control of the depth of ultra-shallow junctions (USJ), such as those used in source-drain extensions, becomes critical. The problem is one of both local control and uniformity over the full area of 200 and 300 mm wafers. This paper des