## Abstract Recently we developed a model for symmetric double‐gate MOSFETs (SDDGM) that, for the first time, considers the doping concentration in the Si film in the complete range from 1×10^14^ to 3×10^18^ cm^−3^. The model covers a wide range of technological parameters and includes short channe
On the suitability of DD and HD models for the simulation of nanometer double-gate MOSFETs
✍ Scribed by Ralf Granzner; V.M Polyakov; F Schwierz; M Kittler; T Doll
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 150 KB
- Volume
- 19
- Category
- Article
- ISSN
- 1386-9477
No coin nor oath required. For personal study only.
✦ Synopsis
The drain currents of nanometer double-gate MOSFETs with gate lengths in the range from 100 to 5 nm are calculated using a hierarchy of simulation approaches. By comparing Monte Carlo (MC), drift-di usion (DD), and hydrodynamic (HD) simulation results the suitability of the DD and HD models for the investigation of the on-and subthreshold currents of nano-scaled MOSFETs is tested. Modiÿcations of the velocity-ÿeld characteristics in the DD simulations are suggested to improve the accuracy of the DD model.
📜 SIMILAR VOLUMES
Quantum effects play an important role in determining the double-gate (DG) MOSFETs characteristics. The non-equilibrium Green's function formalism (NEGF) in real-space (RS) representation provides a rigorous description of quantum transport in nanoscale devices. Unfortunately, the traditional NEGF f