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On the SiOx transition layer in abrupt Si-SiO2 chemical interface in MOS structures

✍ Scribed by J. Suñé; I. Placencia; N. Barniol; E. Farrés; X. Aymerich


Publisher
Elsevier Science
Year
1989
Weight
61 KB
Volume
208
Category
Article
ISSN
0167-2584

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A procedure for the determination of the interface layer thickness between the bulk Ðlm and the Si substrate SiO 2 from single-wavelength null ellipsometric data is described. The e †ect of the angular errors in the angle of incidence is eliminated because it is found along with the Ðlm and interfac