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On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

✍ Scribed by Liu, Xuwen; Haimi, Eero; Hannula, Simo-Pekka; Ylivaara, Oili M. E.; Puurunen, Riikka L.


Book ID
125472228
Publisher
AVS (American Vacuum Society)
Year
2014
Tongue
English
Weight
696 KB
Volume
32
Category
Article
ISSN
0734-2101

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Properties of Al2O3-films deposited on s
✍ Per Ericsson; Stefan Bengtsson; Jarmo Skarp πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 293 KB

A1203-films deposited by atomic layer epitaxy onto silicon wafers were investigated structurally and electrically. A post-deposition anneal at 900Β°C resulted in a decrease in film thickness of about 10% and an increase in the index of refraction of about 3%. The densification did not significantly i