On the properties of AlN thin films grown by low temperature reactive r.f. sputtering

✍ Scribed by Li Xinjiao; Xu Zechuan; He Ziyou; Cao Huazhe; Su Wuda; Chen Zhongcai; Zhou Feng; Wang Enguang

• Publisher: Elsevier Science
• Year: 1986
• Tongue: English
• Weight: 700 KB
• Volume: 139
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(86)90056-8