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On the initial growth of atomic layer deposited TiO2 films on silicon and copper surfaces

✍ Scribed by Qian Tao; Kirsten Overhage; Gregory Jursich; Christos Takoudis

Book ID
116943647
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
915 KB
Volume
520
Category
Article
ISSN
0040-6090

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