𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge

✍ Scribed by Wu, Zhongzhen; Tian, Xiubo; Shi, Jingwei; Wang, Zeming; Gong, Chunzhi; Yang, Shiqin; Chu, Paul K.


Book ID
121752979
Publisher
American Institute of Physics
Year
2011
Tongue
English
Weight
705 KB
Volume
82
Category
Article
ISSN
0034-6748

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


High power impulse magnetron sputtering
✍ AndrΓ© Anders πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 246 KB

High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the spu

Physics of plasma-based ion implantation
✍ Anders, AndrΓ© πŸ“‚ Article πŸ“… 2008 πŸ› John Wiley and Sons 🌐 English βš– 431 KB

## Abstract The emerging technology of High Power Impulse Magnetron Sputtering (HIPIMS) has much in common with the more established technology of Plasma‐Based Ion Implantation & Deposition (PBIID): both use pulsed plasmas, the pulsed sheath periodically evolves and collapses, the plasma‐sheath sys