High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the spu
β¦ LIBER β¦
Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge
β Scribed by Wu, Zhongzhen; Tian, Xiubo; Shi, Jingwei; Wang, Zeming; Gong, Chunzhi; Yang, Shiqin; Chu, Paul K.
- Book ID
- 121752979
- Publisher
- American Institute of Physics
- Year
- 2011
- Tongue
- English
- Weight
- 705 KB
- Volume
- 82
- Category
- Article
- ISSN
- 0034-6748
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