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New Insights into Processes of Hydrogen Incorporation and Hydrogen Diffusion in Hydrogenated Amorphous Silicon

✍ Scribed by Beyer, W.


Publisher
John Wiley and Sons
Year
1997
Tongue
English
Weight
284 KB
Volume
159
Category
Article
ISSN
0031-8965

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A number of alkylsilanes and alkylcarbosilanes of widely different molecular structure are characterized in terms of their ability to form amorphous hydrogenated silicon-carbon (a-Si:C:H) films in atomic hydrogen-induced chemical vapor deposition (AHCVD). The compounds containing only Si-C and C-H b