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Nanostructured porous SiO2 films for antireflection coatings

โœ Scribed by K.M.A. Sobahan; Yong Jun Park; Jin Joo Kim; Chang Kwon Hwangbo

Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
528 KB
Volume
284
Category
Article
ISSN
0030-4018

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Al 2 O 3 /SiO 2 films have been deposited as UV antireflection coatings on 4H-SiC by electron-beam evaporation and characterized by reflection spectrum, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The reflectance of the Al 2 O 3 /SiO 2 films is 0.33% and 10 times l