Optimised antireflection coatings for pl
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Henning Nagel; Armin G. Aberle; Rudolf Hezel
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Article
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1999
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John Wiley and Sons
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English
โ 210 KB
๐ 2 views
Silicon nitride (SiN) ยฎlms fabricated by remote plasma-enhanced chemical vapour deposition (RPECVD) have recently been shown to provide an excellent electronic passivation of silicon surfaces. This property, in combination with its large refractive index, makes RPECVD SiN an ideal candidate for a su