๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Nanoindentation and FEM study of the effect of internal stress on micro/nano mechanical property of thin CNx films

โœ Scribed by Mingwu Bai; Koji Kato; Noritsugu Umehara; Yoshihiko Miyake

Book ID
114085270
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
567 KB
Volume
377-378
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Effects of internal stresses on the mech
Effects of internal stresses on the mechanical properties of deposition thin films
โœ C.T. Chuang; C.K. Chao; R.C. Chang; K.Y. Chu ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 534 KB

Thin films become an important technology because of its outstanding performance in wide engineering applications. The basic of thin film technology is to characterize its mechanical properties, which are strongly dependent on the internal stresses induced by deposition processes. Therefore, an inve

Effects of the substrate on the determin
Effects of the substrate on the determination of thin film mechanical properties by nanoindentation
โœ Ranjana Saha; William D. Nix ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 511 KB

We examine the effects of the substrate on the determination of mechanical properties of thin films by nanoindentation. The properties of aluminum and tungsten films on the following substrates have been studied: aluminum, glass, silicon and sapphire. By studying both soft films on hard substrates a